PROPERTIES OF TIO2 AND SIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION

被引：53

作者：

MCNEIL, JR

ALJUMAILY, GA

JUNGLING, KC

BARRON, AC

机构：

来源：

APPLIED OPTICS | 1985年 / 24卷 / 04期

关键词：

D O I：

10.1364/AO.24.000486

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

收藏

页码：486 / 489

页数：4

相关论文

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[5] ION-ASSISTED DEPOSITION OF BULKLIKE ZRO2 FILMS
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SIE, SH
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 711 - 713
[6] SURFACE SMOOTHING EFFECTS OF THIN-FILM DEPOSITION
MCNEIL, JR
WEI, LJ
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[J]. APPLIED OPTICS, 1985, 24 (04): : 480 - 485
[7] MCNEIT JR, 1984, APPL OPTICS, V23, P559