CR-SI RESISTIVE FILMS PRODUCED BY MAGNETRON PLASMATRON SPUTTERING

被引：14

作者：

SCHILLER, S

HEISIG, U

STEINFELDER, K

KORNDOERFER, C

机构：

来源：

THIN SOLID FILMS | 1982年 / 96卷 / 04期

关键词：

D O I：

10.1016/0040-6090(82)90511-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：279 / 284

页数：6

共 9 条

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[2]

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[5] REACTIVE DC SPUTTERING WITH THE MAGNETRON-PLASMATRON FOR TANTALUM PENTOXIDE AND TITANIUM-DIOXIDE FILMS [J].

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THIN SOLID FILMS, 1979, 63 (02) :369-375

[6]

SCHILLER S, 1981, VAKUUMTECHNIK, V30, P1

[7]

SONNTAG J, 1980, 5TH INT S HIGH PUR M

[8] HIGH-RATE SPUTTERING TECHNIQUES [J].

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[9]

WAITS RK, 1969, J VAC SCI TECHNOL, V6, P3088

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