LOW-TEMPERATURE ION-BEAM MIXING OF PT AND SI MARKERS IN GE

被引：9

作者：

KIM, SJ ^{[1
]}

NICOLET, MA ^{[1
]}

AVERBACK, RS ^{[1
]}

BALDO, P ^{[1
]}

机构：

[1] ARGONNE NATL LAB,DIV MAT SCI & TECHNOL,ARGONNE,IL 60439

来源：

APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 02期

关键词：

D O I：

10.1063/1.95719

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：154 / 156

页数：3

共 15 条

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[9] MOLECULAR-DYNAMICS SIMULATION OF LOW-ENERGY DISPLACEMENT CASCADES IN CU [J].

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