FREE-CARRIER ABSORPTION IN MICROCRYSTALLINE SILICON THIN-FILMS PREPARED BY VERY-HIGH-FREQUENCY GLOW-DISCHARGE

被引:13
作者
PETER, K [1 ]
WILLEKE, G [1 ]
PRASAD, K [1 ]
SHAH, A [1 ]
BUCHER, E [1 ]
机构
[1] UNIV NEUCHATEL,INST MICROTECH,CH-2000 NEUCHATEL,SWITZERLAND
来源
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1994年 / 69卷 / 02期
关键词
D O I
10.1080/01418639408240103
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The optical properties of heavily phosphorus- and boron-doped microcrystalline silicon thin films prepared at 70 MHz in a silane glow discharge have been measured in the visible and near infrared. The experimental data have been analysed in terms of the classical Drude model for free-carrier absorption. Excellent agreement between the carrier concentration deduced from the dispersion of the refractive index and that obtained by Hall-effect measurements has been obtained. A self-consistent analysis of (an)(-1) against lambda(-2) led to the determination of a Drude mobility of 9-15 cm(2) V-1 s(-1) in n-type material. The possible reasons for the deviation from room-temperature Hall values mu(H) of about 1-3 cm(2) V-1 s(-1) are discussed.
引用
收藏
页码:197 / 207
页数:11
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