HOT-CARRIER MEMORY EFFECT IN AN AL/SIN/SIO2/SI MNOS DIODE DUE TO ELECTRICAL STRESS

被引:4
作者
CHANG, CY
TZENG, FC
CHEN, CT
MAO, YW
机构
关键词
D O I
10.1109/EDL.1985.26188
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:448 / 449
页数:2
相关论文
共 6 条
[1]   HOT-ELECTRON EMISSION IN N-CHANNEL IGFETS [J].
COTTRELL, PE ;
TROUTMAN, RR ;
NING, TH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :520-533
[2]   GENERATION OF INTERFACE STATES BY HOT HOLE INJECTION IN MOSFETS [J].
GESCH, H ;
LEBURTON, JP ;
DORDA, GE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (05) :913-918
[3]   RELATIONSHIP BETWEEN MOSFET DEGRADATION AND HOT-ELECTRON-INDUCED INTERFACE-STATE GENERATION [J].
HSU, FC ;
TAM, S .
IEEE ELECTRON DEVICE LETTERS, 1984, 5 (02) :50-52
[4]  
LIANG MS, IEDM, P186
[5]  
MATSUMOTO H, 1981, IEEE T ELECTRON DEV, V28, P923, DOI 10.1109/T-ED.1981.20460
[6]   ROLE OF HOT-HOLE INJECTION IN HOT-CARRIER EFFECTS AND THE SMALL DEGRADED CHANNEL REGION IN MOSFETS [J].
TAKEDA, E ;
SHIMIZU, A ;
HAGIWARA, T .
IEEE ELECTRON DEVICE LETTERS, 1983, 4 (09) :329-331