PLASMA NITRIDED OXIDE-FILMS AS A THIN GATE DIELECTRIC

被引：17

作者：

DEBENEST, P

BARLA, K

STRABONI, A

VUILLERMOZ, B

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 36卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90914-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：196 / 204

页数：9

共 10 条

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[7] TRANSPORT NUMBER MEASUREMENTS DURING PLASMA ANODIZATION OF SI, GAAS, AND ZRSI2 [J].

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[8]

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[9]

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[10] LOW-PRESSURE NITRIDED-OXIDE AS A THIN GATE DIELECTRIC FOR MOSFETS [J].

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