STRUCTURE OF (SQUARE-ROOT-3 X SQUARE-ROOT-3) R 30-DEGREES-B AT THE SI INTERFACE STUDIED BY GRAZING-INCIDENCE X-RAY-DIFFRACTION

被引:24
作者
AKIMOTO, K
HIROSAWA, I
TATSUMI, T
HIRAYAMA, H
MIZUKI, JI
MATSUI, J
机构
[1] Fundamental Research Laboratories, NEC Corporation, Tsukuba, Ibaraki 305, 34, Miyukigaoka
关键词
D O I
10.1063/1.102522
中图分类号
O59 [应用物理学];
学科分类号
摘要
The boron-induced (7/8 × 7/8) R30°reconstruction at the Si interface has been investigated by grazing incidence x-ray diffraction. The in-plane projected struture is found from the structure factors near zero perpendicular momentum transfer. At the a-Si/Si (111) interface, boron atoms at 1/3 ML are substituted for silicon atoms, thus forming a (7/8 × 7/8) R30°lattice and the boronsilicon bond is contracted compared with the siliconsilicon bond. Even at the interface between a solid phase epitaxial Si (111) layer and a Si (111) substrate, the boron-induced (7/8 × 7/8) R30°reconstruction has also been observed and the structure is similar to that observed at the a-Si/Si (111) interface.
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页码:1225 / 1227
页数:3
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