CRACKING AND DELAMINATION OF METAL-ORGANIC VAPOR-DEPOSITED ALUMINA AND SILICA FILMS

被引：18

作者：

HAANAPPEL, VAC ^{[1
]}

VANCORBACH, HD ^{[1
]}

FRANSEN, T ^{[1
]}

GELLINGS, PJ ^{[1
]}

机构：

[1] UNIV TWENTE,DEPT CHEM TECHNOL,POB 217,ENSCHEDE,NETHERLANDS

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1993年 / 167卷 / 1-2期

关键词：

D O I：

10.1016/0921-5093(93)90352-F

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Amorphous alumina and silica films were deposited on AISI 304 by thermal decomposition at atmospheric pressure of aluminium-tri-sec-butoxide and di-acetoxy-di-tertiary-butoxide-silane respectively. Above a critical coating thickness of the oxide films, cracking and delamination occurred during the deposition process. These were due to intrinsic rather than to thermal stresses. Cracking and delamination do not occur simultaneously. The fracture toughness of the film, the substrate and the interface is an important factor. After delamination along the substrate-film interface, the films curled to scrolls, indicating stress. A complete explanation of the stress gradient formed in the film during the deposition process is not yet available.

引用

页码：179 / 185

页数：7

共 21 条

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