STRUCTURE, INTERNAL-STRESSES, ADHESION AND WEAR-RESISTANCE OF SPUTTERED ALUMINA COATINGS

被引：45

作者：

ROTH, T

KLOOS, KH

BROSZEIT, E

机构：

[1] Technical Univ of Darmstadt, Darmstadt, West Ger, Technical Univ of Darmstadt, Darmstadt, West Ger

来源：

THIN SOLID FILMS | 1987年 / 153卷

关键词：

D O I：

10.1016/0040-6090(87)90176-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

12

引用

收藏

页码：123 / 133

页数：11

相关论文

共 12 条

[1] BURAN U, 1983, PUBLICATION GOETZE K, V35
[2] KLOOS KH, 1986, 2ND P INT C PHYS VAP, P87
[3] KLOOS KH, 1985, P EUROTRIB 85
[4] ION-BEAM SPUTTER DEPOSITION OF THIN INSULATING LAYERS FOR APPLICATIONS IN HIGHLY LOADED CONTACTS
KONIGER, ME
REITHMEIER, G
SIMON, M
[J]. THIN SOLID FILMS, 1983, 109 (01) : 19 - 25
[5] INTERNAL-STRESS IN ALUMINUM-OXIDE, TITANIUM CARBIDE AND COPPER-FILMS OBTAINED BY PLANAR MAGNETRON SPUTTERING
KUWAHARA, K
SUMOMOGI, T
KONDO, M
[J]. THIN SOLID FILMS, 1981, 78 (01) : 41 - 47
[6] ELECTRICAL INSULATING PROPERTIES AND THERMAL-STABILITY OF RF-SPUTTERED ALUMINA COATINGS
MANTYLA, TA
VUORISTO, PJM
TELAMA, AK
KETTUNEN, PO
[J]. THIN SOLID FILMS, 1985, 126 (1-2) : 43 - 49
[7] MATTHEWS A, 1985, P SURTEC 85, P627
[8] RF SPUTTERED ALUMINUM OXIDE FILMS ON SILICON
SALAMA, CAT
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) : 913 - &
[9] SCHINTLMEISTER W, 1984, Z METALLKD, V75, P874
[10] INTERNAL-STRESS IN SPUTTER-DEPOSITED AL2O3 FILMS
SHINZATO, S
SUMOMOGI, T
KOFUNE, S
KUWAHARA, K
[J]. THIN SOLID FILMS, 1982, 97 (04) : 333 - 337