INTERNAL-STRESS IN SPUTTER-DEPOSITED AL2O3 FILMS

被引：10

作者：

SHINZATO, S ^{[1
]}

SUMOMOGI, T ^{[1
]}

KOFUNE, S ^{[1
]}

KUWAHARA, K ^{[1
]}

机构：

[1] HIROSHIMA UNIV,FAC ENGN,HIROSHIMA 730,JAPAN

来源：

THIN SOLID FILMS | 1982年 / 97卷 / 04期

关键词：

D O I：

10.1016/0040-6090(82)90525-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：333 / 337

页数：5

共 11 条

[1] ALUMINUM FILMS DEPOSITED BY RF SPUTTERING [J].

DHEURLE, FM .

METALLURGICAL TRANSACTIONS, 1970, 1 (03) :725-&

[2] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J].

HOFFMAN, DW ;

THORNTON, JA .

THIN SOLID FILMS, 1977, 45 (02) :387-396

[3] INTERNAL-STRESS IN ALUMINUM-OXIDE, TITANIUM CARBIDE AND COPPER-FILMS OBTAINED BY PLANAR MAGNETRON SPUTTERING [J].

KUWAHARA, K ;

SUMOMOGI, T ;

KONDO, M .

THIN SOLID FILMS, 1981, 78 (01) :41-47

[4] MEASUREMENT OF THE INTRINSIC STRESS IN THIN-FILMS OF SILVER BY A NEW CANTILEVERED PLATE TECHNIQUE [J].

LAUGIER, M .

THIN SOLID FILMS, 1981, 75 (03) :213-219

[5]

MAISSEL LI, 1971, HDB THIN FILM TECHNO, P12

[6] RESIDUAL COMPRESSIVE STRESS IN SPUTTER-DEPOSITED TIC FILMS ON STEEL SUBSTRATES [J].

PAN, A ;

GREENE, JE .

THIN SOLID FILMS, 1981, 78 (01) :25-34

[7] STRESSES IN SPUTTER-DEPOSITED NICKEL AND COPPER-OXIDE THIN-FILMS [J].

PLUNKETT, PV ;

JOHNSON, RM ;

WISEMAN, CD .

THIN SOLID FILMS, 1979, 64 (01) :121-128

[8] SOME MEASUREMENTS OF STRESS IN THIN FILMS PREPARED BY LOW PRESSURE TRIODE SPUTTERING [J].

STUART, PR .

VACUUM, 1969, 19 (11) :507-+

[9]

SUMOMOGI T, 1980, B FAC ENG HIROSHIMA, V29, P9

[10] ORIGIN OF INTERNAL STRESS IN LOW-VOLTAGE SPUTTERED TUNGSTEN FILMS [J].

SUN, RC ;

TISONE, TC ;

CRUZAN, PD .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) :112-117

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