PREPARATION OF GE/SI AND GE/GAAS HETEROJUNCTIONS

被引:17
作者
RIBEN, AR
FEUCHT, DL
OLDHAM, WG
机构
关键词
D O I
10.1149/1.2423925
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:245 / &
相关论文
共 18 条
[1]   EXPERIMENTS ON GE-GAAS HETEROJUNCTIONS [J].
ANDERSON, RL .
SOLID-STATE ELECTRONICS, 1962, 5 (SEP-O) :341-&
[2]  
CHU TL, 1963, METALLURGY ADVANCED, P209
[3]   SURFACE MEASUREMENTS ON FRESHLY CLEAVED SILICON PARA-NORMAL JUNCTIONS [J].
GOBELI, GW ;
ALLEN, FG .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 14 :23-&
[4]   EPITAXIAL VAPOR GROWTH OF GE SINGLE CRYSTALS IN A CLOSED-CYCLE PROCESS [J].
MARINACE, JC .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1960, 4 (03) :248-255
[5]  
MARINACE JC, 1963, ELECTROCHEM TECHNOL, V1, P104
[7]  
OLDHAM WG, 1963, J ELECTROCHEM SOC, V110, pC53
[8]   INTERFACE STATES IN ABRUPT SEMICONDUCTOR HETEROJUNCTIONS [J].
OLDHAM, WG ;
MILNES, AG .
SOLID-STATE ELECTRONICS, 1964, 7 (02) :153-165
[9]  
OLDHAM WG, 1963, AD412297 CARN I TECH
[10]  
OLDHAM WG, 1963, THESIS CARNEGIE I TE