SILICON-NITRIDE STENCIL MASKS FOR HIGH-RESOLUTION ION LITHOGRAPHY PROXIMITY PRINTING

被引:26
作者
RANDALL, JN
FLANDERS, DC
ECONOMOU, NP
DONNELLY, JP
BROMLEY, EI
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期
关键词
D O I
10.1116/1.582655
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1152 / 1155
页数:4
相关论文
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