A COMPARISON BETWEEN THERMAL ANNEALING AND ION MIXING OF MULTILAYERED NI-W FILMS ON SI .2.

被引:10
作者
PAI, CS
LAU, SS
POKER, DB
HUNG, LS
机构
[1] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37831
[2] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
关键词
D O I
10.1063/1.335550
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4178 / 4185
页数:8
相关论文
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