EFFECTS OF IONIZING-RADIATION ON THE NOISE PROPERTIES OF DMOS POWER TRANSISTORS

被引:17
作者
BABCOCK, JA
TITUS, JL
SCHRIMPF, RD
GALLOWAY, KF
机构
[1] UNIV ARIZONA,DEPT ELECT & COMP ENGN,TUCSON,AZ 85721
[2] USN,CTR NAVAL WEAP SUPPORT,CRANE,IN 47522
关键词
D O I
10.1109/23.124109
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The 1/f noise properties of DMOS (double-diffused MOS) power transistors were examined as a function of total ionizing dose. The results indicate that radiation causes significant changes in the frequency dependence of the noise of the power MOSFETs studied. Before exposure to radiation, the noise power spectral density indicated a 1/f(lambda) relationship where lambda-ranged from approximately 0.5 to 1.0. As the total dose level increased, lambda-approached unity, while the magnitude of the noise increased proportionally with the radiation-induced charge density. In addition, noise measurements were performed after irradiation, while the devices were annealing under a +/- 12 V bias. It was found that, under the +12 V bias, lambda-increased and under the -12 V bias, lambda-decreased. Finally, no correlation was found between the pre-irradiation 1/f noise magnitude and the radiation hardness of these DMOS power transistors.
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页码:1304 / 1309
页数:6
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