LINEARITY AND ENHANCED SENSITIVITY OF SHIPLEY AZ-1350B PHOTORESIST

被引：12

作者：

LIVANOS, AC ^{[1
]}

KATZIR, A ^{[1
]}

SHELLAN, JB ^{[1
]}

YARIV, A ^{[1
]}

机构：

[1] CALTECH, PASADENA, CA 91125 USA

来源：

关键词：

D O I：

10.1364/AO.16.001633

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1633 / 1635

页数：3

共 9 条

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[3] IMPROVED DEVELOPMENT FOR HOLOGRAMS RECORDED IN PHOTORESIST
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[7] FABRICATION OF GRATING STRUCTURES WITH VARIABLE PERIOD
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[J]. OPTICS COMMUNICATIONS, 1977, 20 (01) : 179 - 182
[8] LOPREST FJ, 1971, PHOTOGR SCI ENG, V15, P260
[9] SPECTRAL SENSITIVITY AND LINEARITY OF SHIPLEY AZ-1350J PHOTORESIST
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