REACTIONS BETWEEN TI AND AL FILMS ON A-SI-H

[1] BOWER RW, 1973, APPL PHYS LETT, V23, P99, DOI 10.1063/1.1654823

[2] INTERACTION BETWEEN N-TYPE AMORPHOUS HYDROGENATED SILICON FILMS AND METAL-ELECTRODES [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (05) : 3909 - 3911

[3] REACTION BETWEEN HYDROGENATED AMORPHOUS-SILICON AND ALUMINUM FILM [J]. TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS, 1984, 25 (06): : 375 - 381

[4] ITO T, UNPUB

[5] MARUYAMA E, 1982, FUNDAMENTALS AMORPHO, P173

[6] TI AND V LAYERS RETARD INTERACTION BETWEEN AL FILMS AND POLYCRYSTALLINE SI [J]. APPLIED PHYSICS LETTERS, 1976, 28 (05) : 277 - 280

[7] ATOMIC MIGRATION OF METALS IN THE INTERFACES OF AU-SI AND NI-SI FOR CRYSTALLINE AND AMORPHOUS SI OBSERVED BY 40 MEV-O-5+ ION BACKSCATTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (12): : L932 - L934

[8] Tsai C. C., 1980, Journal of the Physical Society of Japan, V49, P1265

[1] BOWER RW, 1973, APPL PHYS LETT, V23, P99, DOI 10.1063/1.1654823

[2] INTERACTION BETWEEN N-TYPE AMORPHOUS HYDROGENATED SILICON FILMS AND METAL-ELECTRODES [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (05) : 3909 - 3911

[3] REACTION BETWEEN HYDROGENATED AMORPHOUS-SILICON AND ALUMINUM FILM [J]. TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS, 1984, 25 (06): : 375 - 381

[4] ITO T, UNPUB

[5] MARUYAMA E, 1982, FUNDAMENTALS AMORPHO, P173

[6] TI AND V LAYERS RETARD INTERACTION BETWEEN AL FILMS AND POLYCRYSTALLINE SI [J]. APPLIED PHYSICS LETTERS, 1976, 28 (05) : 277 - 280

[7] ATOMIC MIGRATION OF METALS IN THE INTERFACES OF AU-SI AND NI-SI FOR CRYSTALLINE AND AMORPHOUS SI OBSERVED BY 40 MEV-O-5+ ION BACKSCATTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (12): : L932 - L934

[8] Tsai C. C., 1980, Journal of the Physical Society of Japan, V49, P1265