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EFFECT OF HYDROGEN PRESSURE ON THE DEPOSITION OF AMORPHOUS-SILICON FILMS BY TETRODE RF SPUTTERING

被引：5
作者：
GEKKA, Y
ASAI, H
TEMMA, T
YASUMURA, Y
机构：
来源：
APPLICATIONS OF SURFACE SCIENCE | 1985年 / 22-3卷 / MAY期
关键词：
D O I：
10.1016/0378-5963(85)90222-3
中图分类号：
学科分类号：
摘要：
引用
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页码：899 / 907
页数：9
相关论文
共 7 条
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