INVESTIGATION OF ION-IMPLANTED GAP LAYERS BY ELLIPSOMETRY

被引：18

作者：

DOBBS, BC ^{[1
]}

ANDERSON, WJ ^{[1
]}

PARK, YS ^{[1
]}

机构：

[1] USAF,AVION LAB,WRIGHT PATTERSON AFB,OH 45433

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 12期

关键词：

D O I：

10.1063/1.323579

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：5052 / 5056

页数：5

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