A NEW MATERIAL FOR THE FABRICATION OF THIN-FILM RESISTORS

被引：10

作者：

ANGADI, MA ^{[1
]}

SHIVAPRASAD, SM ^{[1
]}

机构：

[1] UNIV SUSSEX, DEPT PHYS, BRIGHTON BN1 9RH, E SUSSEX, ENGLAND

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1984年 / 3卷 / 08期

关键词：

D O I：

10.1007/BF00719936

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：739 / 742

页数：4

共 14 条

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[3]

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[4]

Chopra K.L, 1969, THIN FILM PHENOMENA

[5]

DEGENHART HJ, 1967, P ELECT COMP C, P84

[6]

HOFFMAN DM, 1960, 7TH T NAT VAC S, P218

[7] THIN FILMS OF TITANIUM + TITANIUM OXIDE FOR MICROMINIATURIZATION [J].

HUBER, F .

IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02) :38-&

[8] SPUTTERED TITANIUM OXIDE FILMS FOR MICROCIRCUIT APPLICATIONS [J].

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WYSOCKI, CA ;

SLEGESKY, WJ .

IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02) :14-&

[9]

MAISSEL LI, 1970, HDB THIN FILM TECHNO, P18

[10] THERMOELECTRIC-POWER, HALL-COEFFICIENT, AND STRUCTURE PROPERTIES OF TA THIN-FILMS RF SPUTTERED IN AR-N2-O2 [J].

PERINATI, A ;

PIACENTINI, GF .

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