SURFACE SEGREGATION DURING ALLOY SPUTTERING AND IMPLANTATION

被引:91
作者
ANDERSEN, HH [1 ]
STENUM, B [1 ]
SORENSEN, T [1 ]
WHITLOW, HJ [1 ]
机构
[1] AARHUS UNIV,INST PHYS,DK-8000 AARHUS C,DENMARK
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 209卷 / MAY期
关键词
One of us; (HJW) acknowledges support from a NATO post doctoral Fellowship;
D O I
10.1016/0167-5087(83)90843-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
38
引用
收藏
页码:487 / 494
页数:8
相关论文
共 39 条
[1]   SURFACE SEGREGATION IN BINARY SOLID-SOLUTIONS - A THEORETICAL AND EXPERIMENTAL PERSPECTIVE [J].
ABRAHAM, FF ;
BRUNDLE, CR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :506-519
[2]   DOSE DEPENDENCE OF 45 keV V + AND Bi + ION SPUTTERING YIELD OF COPPER. [J].
Andersen, Hans Henrik .
Radiation Effects, 1973, 19 (04) :257-261
[3]   THE ANGULAR-DISTRIBUTION OF MATERIAL SPUTTERED FROM AGAU AND CUPT BY20-80KEV ARGON [J].
ANDERSEN, HH ;
CHEVALLIER, J ;
CHERNYSH, V .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 191 (1-3) :241-244
[4]   MEASUREMENTS OF ANGULAR-DISTRIBUTIONS OF SPUTTERED MATERIAL AS A NEW TOOL FOR SURFACE-SEGREGATION STUDIES - SEGREGATION IN CUPT ALLOYS [J].
ANDERSEN, HH ;
CHERNYSH, V ;
STENUM, B ;
SORENSEN, T ;
WHITLOW, HJ .
SURFACE SCIENCE, 1982, 123 (01) :39-46
[5]  
ANDERSEN HH, ION IMPLANTATION BEA
[6]  
ANDERSEN HH, PHYSICA SCRIPTA
[7]  
ANDERSEN HH, 1981, TOP APPL PHYS, V47, P145, DOI [10.1007/3540105212_9, DOI 10.1007/3540105212_9]
[8]  
ANDERSEN HH, 1980, SPIG 1980, P421
[9]  
ANDERSEN HH, 1972, RADIAT EFF, V13, P67
[10]  
Bottiger J., 1971, Radiation Effects, V11, P61, DOI 10.1080/00337577108230450