FORMING, NEGATIVE-RESISTANCE, PRESSURE EFFECT, DIELECTRIC-BREAKDOWN AND ELECTRODE DIFFUSION IN THIN SIOX FILMS WITH LATERALLY SPACED ELECTRODES

被引：5

作者：

ALISMAIL, SAY

HOGARTH, CA

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1985年 / 20卷 / 06期

关键词：

D O I：

10.1007/BF01112302

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2186 / 2192

页数：7

共 28 条

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