SPE-COSI2 SUBMICROMETER LINES BY LIFT-OFF USING SELECTIVE REACTION AND ITS APPLICATION TO A PERMEABLE-BASE TRANSISTOR

被引：28

作者：

ISHIBASHI, K ^{[1
]}

FURUKAWA, S ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,GRAD SCH SCI & ENGN,YOKOHAMA,KANAGAWA 227,JAPAN

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1986年 / 33卷 / 03期

关键词：

D O I：

10.1109/T-ED.1986.22490

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：322 / 327

页数：6

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