PROXIMITY CORRECTION ON THE AEBLE-150

被引：14

作者：

OTTO, OW ^{[1
]}

GRIFFITH, AK ^{[1
]}

机构：

[1] AP SYST,SANTA MONICA,CA 90403

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.583971

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：443 / 447

页数：5

共 12 条

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[6] VERIFICATION OF A PROXIMITY EFFECT CORRECTION PROGRAM IN ELECTRON-BEAM LITHOGRAPHY
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[7] NAKAYAMA N, 1982, 10TH P INT C EL ION, P252
[8] EBCAD - FULLY INTEGRATED PATTERN DATA-PROCESSING FOR DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY SYSTEMS
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[9] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY
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[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) : 4371 - 4377
[10] PARIKH M, 1978, 7TH P INT C EL ION B, P382