IMPROVED CONTROL OF TIN COATING PROPERTIES USING CATHODIC ARC EVAPORATION WITH A PULSED BIAS

被引:82
作者
OLBRICH, W [1 ]
FESSMANN, J [1 ]
KAMPSCHULTE, G [1 ]
EBBERINK, J [1 ]
机构
[1] G GUHRING KG,W-7480 SIGMARINGEN,GERMANY
关键词
D O I
10.1016/0257-8972(91)90065-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A combined d.c.-pulse bias voltage was used in combination with a cathodic arc evaporation process for the deposition of TiN on planar plates and drilling tools at substrate temperatures T between 330 and 500-degrees-C. This new pulse technique appeared to be a powerful tool to achieve independent control of the substrate temperature, coating adhesion and uniformity of deposition. As a result, high coating adhesion can be obtained at low substrate temperatures. The adhesion uniformity across large-area samples is considerably improved. Unpolished rough substrate parts can be coated without cauliflower-like growth defects. Because of intensive ion bombardment in the pulse period, smoother TiN coatings with a reduced droplet size were obtained.
引用
收藏
页码:258 / 262
页数:5
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