RECENT ADVANCES IN THE POLYFILAMENTARY MODEL FOR ELECTRONIC CONDUCTION IN ELECTROFORMED INSULATING FILMS

被引:20
作者
RAY, AK [1 ]
HOGARTH, CA [1 ]
机构
[1] BRUNEL UNIV,DEPT PHYS,UXBRIDGE UB8 3PH,MIDDX,ENGLAND
关键词
D O I
10.1080/00207219008920295
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A state-of-art review is presented of modifications introduced to the original polyfilamentary model for electronic conduction in electroformed insulating films. The solution of the one-dimensional heat equation, satisfying some physically realistic boundary conditions, is believed to be the best technique for describing thermal dissipation. New criteria based upon thermal loss through the positively biased electrode are obtained for the occurrence of voltage-controlled negative resistance. Different types of distributions of filamentary parameters are considered, and the normal distributions of the values of radii and resistivities among the filament population are found to provide a satisfactory basis for determining current-voltage characteristics for metal/insulator/metal structures. The experimentally observed shift in the peak of the I (V) characteristics is explained in terms of variations in the statistical parameters characterizing a probability density function for the distributions. © 1990 Taylor & Francis Ltd.
引用
收藏
页码:97 / 107
页数:11
相关论文
共 27 条
[1]   TEMPERATURE-DEPENDENCE OF VOLTAGE-CONTROLLED NEGATIVE-RESISTANCE IN AN ELECTROFORMED CU-SIOX-CU STRUCTURE [J].
ALISMAIL, SAY ;
HOGARTH, CA .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 76 (02) :559-563
[2]   METAL-INSULATOR-METAL SANDWICH STRUCTURES WITH ANOMALOUS PROPERTIES [J].
BIEDERMAN, H .
VACUUM, 1976, 26 (12) :513-523
[3]   THE ELECTROFORMING PROCESS IN MIM DIODES [J].
BLESSING, R ;
PAGNIA, H ;
SOTNIK, N .
THIN SOLID FILMS, 1981, 85 (02) :119-128
[4]   ELECTRICAL PHENOMENA IN AMORPHOUS OXIDE FILMS [J].
DEARNALEY, G ;
STONEHAM, AM ;
MORGAN, DV .
REPORTS ON PROGRESS IN PHYSICS, 1970, 33 (11) :1129-+
[5]  
Dearnaley G., 1970, Journal of Non-Crystalline Solids, V4, P593, DOI 10.1016/0022-3093(70)90097-9
[6]   ELECTRONIC CONDUCTION THEORUGH THIN UNSATURATED OXIDE LAYERS [J].
DEARNALEY, G .
PHYSICS LETTERS A, 1967, A 25 (10) :760-+
[7]   MEASUREMENT TECHNIQUES IN MIM DEVICE CHARACTERIZATION [J].
DUNNE, PJ ;
COLLINS, RA .
INTERNATIONAL JOURNAL OF ELECTRONICS, 1990, 68 (03) :373-383
[8]  
Gould R. D., 1987, Materials Science, V13, P105
[10]   RELATIONSHIP OF THE CURRENT-VOLTAGE CHARACTERISTICS TO THE DISTRIBUTION OF FILAMENT RESISTANCES IN ELECTROFORMED MIM STRUCTURES [J].
GOULD, RD .
THIN SOLID FILMS, 1979, 57 (01) :33-38