EFFECTS OF ARGON PRESSURE ON THE STRUCTURE AND PROPERTIES OF DC PLANAR-MAGNETRON-SPUTTERED METAL AND SEMICONDUCTOR-FILMS WITH IMPLICATIONS FOR SOLAR-ENERGY APPLICATIONS

被引：13

作者：

CRAIG, S

HARDING, GL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 03期

关键词：

Compendex;

D O I：

10.1116/1.571832

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

CARBON - Thin Films - SEMICONDUCTING SILICON - Thin Films - SEMICONDUCTOR MATERIALS - Thin Films - SOLAR ENERGY - STEEL - Thin Films

引用

页码：833 / 837

页数：5

共 18 条

[1] EFFECTS OF ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF SPUTTERED COPPER-FILMS [J].

CRAIG, S ;

HARDING, GL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02) :205-215

[2] EFFECTS OF ARGON PRESSURE ON THE STRUCTURE OF DC CYLINDRICAL MAGNETRON SPUTTERED THIN COPPER-FILMS [J].

CRAIG, S ;

HARDING, GL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :754-755

[3] SOLAR SELECTIVE PROPERTIES OF ROUGH SPUTTERED COPPER-FILMS [J].

CRAIG, S ;

HARDING, GL .

SOLAR ENERGY MATERIALS, 1981, 4 (03) :245-264

[4]

CRAIG S, THIN SOLID FILMS

[5]

HARDING GL, SOL ENERGY MATER

[6] COMPRESSIVE STRESS AND INERT-GAS IN MO FILMS SPUTTERED FROM A CYLINDRICAL POST MAGNETRON WITH NE, AR, KR, AND XE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01) :380-383

[7] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS [J].

KNIGHTS, JC ;

LUJAN, RA .

APPLIED PHYSICS LETTERS, 1979, 35 (03) :244-246

[8] GROWTH-MORPHOLOGY AND DEFECTS IN PLASMA-DEPOSITED A-SI-H FILMS [J].

KNIGHTS, JC .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) :159-170

[9]

MACDONALD RG, COMMUNICATION

[10] HIGH-RATE SPUTTERING OF ALUMINUM FOR METALLIZATION OF INTEGRATED-CIRCUITS [J].

MCLEOD, PS ;

HARTSOUGH, LD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :263-265

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