SURFACE-MORPHOLOGY OF SI(100), GAAS(100) AND INP(100) FOLLOWING O-2+ AND CS+ ION-BOMBARDMENT

被引:56
作者
DUNCAN, S
SMITH, R
SYKES, DE
WALLS, JM
机构
关键词
D O I
10.1016/0042-207X(84)90117-9
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:145 / 151
页数:7
相关论文
共 10 条
[1]   ANALYTICAL MICROSCOPY BY SECONDARY ION IMAGING TECHNIQUES [J].
CASTAING, R ;
SLODZIAN, G .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1981, 14 (10) :1119-1127
[2]   SURFACE-TOPOGRAPHY OF ELECTRONIC MATERIALS FOLLOWING OXYGEN AND CESIUM ION-BOMBARDMENT [J].
DUNCAN, S ;
SMITH, R ;
SYKES, DE ;
WALLS, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :621-622
[3]  
LEWIS GW, 1980, 1980 P S SPUTT VIENN, P604
[4]   ION PROBE MICROANALYSIS [J].
LIEBL, H .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1975, 8 (10) :797-808
[5]   DEPTH PROFILING BY SIMS DEPTH RESOLUTION, DYNAMIC-RANGE AND SENSITIVITY [J].
MAGEE, CW ;
HONIG, RE .
SURFACE AND INTERFACE ANALYSIS, 1982, 4 (02) :35-41
[7]  
TSUNOYAMA K, 1974, JAP J APPL PHYS, V13, P168
[8]  
WALLS JM, 1982, P TECHNICAL PROGRAMM, P214
[9]  
Werner H. W., 1980, Surface and Interface Analysis, V2, P56, DOI 10.1002/sia.740020205
[10]   ASPECTS OF QUANTITATIVE SECONDARY ION MASS-SPECTROMETRY [J].
WITTMAACK, K .
NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3) :343-356