REACTIVELY MAGNETRON SPUTTERED HF-N FILMS .2. HARDNESS AND ELECTRICAL-RESISTIVITY

被引：53

作者：

JOHANSSON, BO

SUNDGREN, JE

HELMERSSON, U

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 08期

关键词：

D O I：

10.1063/1.335813

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3112 / 3117

页数：6

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[8] REACTIVELY MAGNETRON SPUTTERED HF-N FILMS .1. COMPOSITION AND STRUCTURE
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