SELECTIVE ETCHING AND PHOTOETCHING OF (100) GALLIUM-ARSENIDE IN CRO3-HF AQUEOUS-SOLUTIONS .1. INFLUENCE OF COMPOSITION ON ETCHING BEHAVIOR

被引:89
作者
WEYHER, J
VANDEVEN, J
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关键词
D O I
10.1016/0022-0248(83)90217-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:285 / 291
页数:7
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