NI-SI MIXING - A NEW MODEL FOR LOW-TEMPERATURE SILICIDE FORMATION

被引：62

作者：

VANLOENEN, EJ ^{[1
]}

VANDERVEEN, JF ^{[1
]}

LEGOUES, FK ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

SURFACE SCIENCE | 1985年 / 157卷 / 01期

关键词：

D O I：

10.1016/0039-6028(85)90631-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：1 / 16

页数：16

共 31 条

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