COMPOSITIONAL CHARACTERIZATION OF MICROWAVE PLASMA A-SI-H FILMS

被引：21

作者：

CURRIE, JF ^{[1
]}

DEPELSENAIRE, P ^{[1
]}

HUOT, JP ^{[1
]}

PAQUIN, L ^{[1
]}

WERTHEIMER, MR ^{[1
]}

YELON, A ^{[1
]}

BRASSARD, C ^{[1
]}

LECUYER, J ^{[1
]}

GROLEAU, R ^{[1
]}

MARTIN, JP ^{[1
]}

机构：

[1] UNIV MONTREAL,PHYS NUCL LAB,MONTREAL H3C 3A7,QUEBEC,CANADA

来源：

关键词：

D O I：

10.1139/p83-073

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：582 / 590

页数：9

共 25 条

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