MICROSCOPIC CONTROL OF SEMICONDUCTOR SURFACE OXIDATION

被引：40

作者：

FRANCIOSI, A ^{[1
]}

CHANG, S ^{[1
]}

PHILIP, P ^{[1
]}

CAPRILE, C ^{[1
]}

JOYCE, J ^{[1
]}

机构：

[1] UNIV WISCONSIN,MAT SCI PROGRAM,MADISON,WI 53713

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.573354

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：933 / 937

页数：5

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