CORRELATIONS BETWEEN PLASMA PARAMETERS AND THE DEPOSITION OF MICROCRYSTALLINE SILICON FILMS BY PLASMA OF ARGON AND HYDROGEN

被引:5
作者
AVNI, R [1 ]
CARMI, U [1 ]
MANORY, R [1 ]
GRILL, A [1 ]
GROSSMAN, E [1 ]
机构
[1] BEN GURION UNIV NEGEV,DEPT MAT ENGN,IL-84107 BEER SHEVA,ISRAEL
关键词
D O I
10.1063/1.339852
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:2044 / 2049
页数:6
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