STRESS IN A-SI1-XCX-H STUDIED BY (N,-N) DOUBLE CRYSTAL DIFFRACTOMETRY

被引:5
作者
ZHANG, ZY [1 ]
QI, MW [1 ]
CHEN, JY [1 ]
CHENG, RG [1 ]
机构
[1] ACAD SINICA,SHANGHAI INST CERAM,SHANGHAI 200050,PEOPLES R CHINA
关键词
D O I
10.1016/0022-3093(89)90633-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:510 / 512
页数:3
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