STUDY OF THE BROAD LUMINESCENCE BANDS IN GE-IMPLANTED GAAS CENTERED AT 1.44-1.46 EV

被引:6
作者
KEEFER, KJ
YEO, YK
HENGEHOLD, RL
机构
[1] Air Force Institute of Technology, Wright-Patterson Air Force Base, Dayton
关键词
D O I
10.1063/1.349075
中图分类号
O59 [应用物理学];
学科分类号
摘要
Above- and below-band-gap excitation photoluminescence studies were performed on GaAs samples implanted with Ge, Ga, As, {Ge + Ga}, and {Ge + As} to assess the nature of a broad luminescence band, the so-called Q band, centered in the 1.44-1.46-eV range. Below-band-gap excitation enabled resolution of the broad band into two separate overlapping bands. These measurements, in conjunction with sample temperature-dependent studies, indicate that the main contribution to the broad band observed in Ge-implanted GaAs is due to the Ga antisite double-acceptor defect.
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页码:4634 / 4636
页数:3
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