THE ROLE OF EPITAXY AND SUBSTRATE ON JUNCTION FORMATION IN ION-IMPLANTED HGCDTE

被引:10
作者
BUBULAC, LO
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D O I
10.1016/0022-0248(85)90194-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:478 / 484
页数:7
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  • [1] BORON ION-IMPLANTATION IN HG1-XCDXTE
    BAARS, J
    HURRLE, A
    ROTHEMUND, W
    FRITZSCHE, CR
    JAKOBUS, T
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1461 - 1466
  • [2] STRUCTURE OF ION-IMPLANTED AND ANNEALED HG1-XCDXTE
    BAHIR, G
    KALISH, R
    [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) : 3129 - 3140
  • [3] DAMAGE AND LATTICE LOCATION STUDIES IN HG IMPLANTED HG1-XCDXTE
    BAHIR, G
    BERNSTEIN, T
    KALISH, R
    [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1980, 48 (1-4): : 247 - 252
  • [4] ION-IMPLANTATION STUDY OF HGCDTE
    BUBULAC, LO
    TENNANT, WE
    SHIN, SH
    WANG, CC
    LANIR, M
    GERTNER, ER
    MARSHALL, ED
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 : 495 - 500
  • [5] BUBULAC LO, 1982, J VAC SCI TECHNOL, V21, P521
  • [6] BUBULAC LO, 1983, J VAC SCI TECHNOL, V13, P1946
  • [7] ION-IMPLANTATION IN HG1-XCDXTE
    DESTEFANIS, GL
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 209 (MAY): : 567 - 580
  • [8] ELECTRICAL AND OPTICAL-PROPERTIES OF ION-IMPLANTED HG1-XCDXTE/CDTE EPILAYERS
    DESTEFANIS, GL
    BOCH, R
    ROUSSILLE, R
    [J]. JOURNAL OF CRYSTAL GROWTH, 1982, 59 (1-2) : 270 - 275
  • [9] LIQUID-PHASE EPITAXIAL-GROWTH OF LARGE AREA HG1-XCDXTE EPITAXIAL LAYERS
    EDWALL, DD
    GERTNER, ER
    TENNANT, WE
    [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (06) : 1453 - 1460
  • [10] KOZYREV SP, 1983, SOV PHYS SEMICOND+, V17, P560