REACTIONS OF ZR THIN-FILMS WITH SIO2 SUBSTRATES

被引:104
作者
WANG, SQ
MAYER, JW
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10.1063/1.341208
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O59 [应用物理学];
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页码:4711 / 4716
页数:6
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共 35 条
[1]  
BARIN I, 1977, THERMOCHEMICAL PRO S
[2]  
Barin I., 1973, THERMOCHEMICAL PROPE
[3]   TITANIUM SILICIDE FORMATION - EFFECT OF OXYGEN DISTRIBUTION IN THE METAL-FILM [J].
BERTI, M ;
DRIGO, AV ;
COHEN, C ;
SIEJKA, J ;
BENTINI, GG ;
NIPOTI, R ;
GUERRI, S .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) :3558-3565
[4]   THERMODYNAMIC CONSIDERATIONS IN REFRACTORY METAL-SILICON-OXYGEN SYSTEMS [J].
BEYERS, R .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (01) :147-152
[5]   PHASE-EQUILIBRIA IN THIN-FILM METALLIZATIONS [J].
BEYERS, R ;
SINCLAIR, R ;
THOMAS, ME .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04) :781-784
[6]  
BEYERS R, 1983, MAT RES SOC S P, V14, P423
[7]  
BEYERS R, 1985, P S HIGH TEMPERATURE, V3
[8]   IDENTIFICATION OF DIFFUSION SPECIES IN V-SIO2 REACTIONS [J].
CHU, WK ;
TU, KN .
APPLIED PHYSICS LETTERS, 1978, 33 (01) :83-85
[9]  
COLGAN EG, 1987, THESIS CORNELL U
[10]  
ELLIOTT RP, 1965, CONSTITUTION BINARY