TITANIUM SILICIDE FORMATION - EFFECT OF OXYGEN DISTRIBUTION IN THE METAL-FILM

被引：107

作者：

BERTI, M

DRIGO, AV

COHEN, C

SIEJKA, J

BENTINI, GG

NIPOTI, R

GUERRI, S

机构：

[1] UNIV PARIS 07,ECOLE NORMALE SUPER,PHYS SOLIDES GRP,F-75221 PARIS,FRANCE

[2] CNR,IST LAMEL,I-40126 BOLOGNA,ITALY

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 10期

关键词：

D O I：

10.1063/1.332946

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3558 / 3565

页数：8

共 24 条

[1] PRECISION ABSOLUTE THIN-FILM STANDARD REFERENCE TARGETS FOR NUCLEAR-REACTION MICROANALYSIS OF OXYGEN ISOTOPES .1. O-16 STANDARDS
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[2] 7ICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS USING A 2 MEV VAN-DE-GRAAFF
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[3] MICROANALYSIS OF NITROGEN BY MEANS OF DIRECT OBSERVATION OF NUCLEAR REACTIONS . APPLICATIONS
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[4] NUCLEATION-CONTROLLED THIN-FILM INTERACTIONS - SOME SILICIDES
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[5] TITANIUM AND NICKEL SILICIDE FORMATION AFTER Q-SWITCHED LASER AND MULTI-SCANNING ELECTRON-BEAM IRRADIATION
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[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1525 - 1531
[6] BERTI M, UNPUB
[7] CO2SI, CRSI2, ZRSI2 AND TISI2 FORMATION STUDIED BY A RADIOACTIVE SI-31 MARKER TECHNIQUE
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PRETORIUS, R
[J]. THIN SOLID FILMS, 1982, 93 (1-2) : 127 - 133
[8] GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON
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[J]. APPLIED PHYSICS LETTERS, 1972, 20 (09) : 359 - &
[9] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION
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[J]. THIN SOLID FILMS, 1975, 25 (02) : 393 - 402
[10] COHEN C, NUCL INSTRUM METHODS

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