ON-AXIS SINGLE-TARGET SPUTTER-DEPOSITION OF YBCO ON SI AND YSZ

Thin films of YBa2Cu3O7-delta were deposited by on-axis single-target magnetron sputtering from stoichiometric targets onto (100) silicon substrates with yttria-stabilized zirconia (YSZ) buffer layers and onto single-crystal(100) YSZ substrates. The films deposited on the silicon substrates are highly c-axis textured, while the films on single-crystal YSZ are epitaxial with both a- and c-axis orientation depending on the deposition conditions. High deposition rates of 2500 Angstrom h(-1) for YSZ films and 3500 Angstrom h(-1) for superconducting films on silicon were achieved. With higher oxygen partial pressures and deposition temperatures, the deposition rate bf the superconducting films on YSZ substrates was found to be about five times smaller. Superconducting films with T-c(onset) greater than or equal to 90 K and transition width (90%-10%) less than or equal to 8 K were obtained.