SUBMICRON MICROBEAM APPARATUS USING A SINGLE-ENDED ACCELERATOR WITH VERY HIGH-VOLTAGE STABILITY

被引：51

作者：

KAMIYA, T

SUDA, T

TANAKA, R

机构：

[1] Advanced Radiation Technology Center, Japan Atomic Energy Research Institute, Takasaki, Gunma

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 104卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)00399-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The JAERI light-ion microbeam apparatus for high-resolution ion beam analysis was constructed and installed on a beam line of 3 MV single-ended electrostatic accelerator with a high voltage stability of +/- 1 x 10(-5). In a performance test of the apparatus, the spot size of 0.4 x 0.4 mu m(2) in FWHM has been achieved so far by using 2 MeV helium ion beam with a target beam current of 77 pA. The light-ion microbeam apparatus and the accelerator system and the beam size measurement using 2 MeV helium ions is described. The ion beam optical design for submicron microbeam is also discussed.

引用

页码：43 / 48

页数：6

共 17 条

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