EPITAXIAL-GROWTH OF HIGHLY CRYSTALLINE AND CONDUCTIVE NITRIDE FILMS BY PULSED-LASER DEPOSITION

被引：43

作者：

LEE, MB ^{[1
]}

KAWASAKI, M ^{[1
]}

YOSHIMOTO, M ^{[1
]}

KUMAGAI, M ^{[1
]}

KOINUMA, H ^{[1
]}

机构：

[1] KANAGAWA HIGH TECHNOL FDN,MAT CHARACTERIZAT LAB,TAKATSU KU,KAWASAKI,KANAGAWA 213,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 11期

关键词：

PULSED LASER DEPOSITION; EPITAXIAL THIN FILMS; HIGH ELECTRICAL CONDUCTIVITY; TIN; ZRN;

D O I：

10.1143/JJAP.33.6308

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

KrF pulsed excimer laser deposition was found to produce epitaxial TiN and ZrN films on Si{100} and MgO{100} substrates, respectively, with optimized laser fluence, substrate temperature and nitrogen ambient pressure. The epitaxial nature of these films was confirmed by the X-ray pole figure, and the crystallinity was evaluated from the full width at half-maximum of the X-ray omega-rocking curve and Rutherford backscattering spectroscopy. The electrical resistivities of these epitaxial TiN and ZrN films were as low as 40 mu Omega cm. The crystal orientation and impurity phase formation are discussed based on a thermodynamic consideration.

引用

页码：6308 / 6311

页数：4

共 16 条

[1]

CAMPBELL IE, 1967, HIGH TEMPERATURE MAT, P381

[2] INTERNAL-STRESSES IN SPUTTERED CHROMIUM [J].

HOFFMAN, DW ;

THORNTON, JA .

THIN SOLID FILMS, 1977, 40 (JAN) :355-363

[3]

JACOBSSON BE, 1982, THIN SOLID FILMS, V87, P181

[4] BIAS EFFECT ON THE MICROSTRUCTURE AND DIFFUSION BARRIER CAPABILITY OF SPUTTERED TIN AND TIOXNY FILMS [J].

JIN, P ;

MARUNO, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (5A) :1446-1452

[5]

KANAMORI S, 1986, THIN SOLID FILMS, V139, P195

[6] TITANIUM NITRIDE CRYSTAL-GROWTH WITH PREFERRED ORIENTATION BY DYNAMIC MIXING METHOD [J].

KIUCHI, M ;

TOMITA, M ;

FUJII, K ;

SATOU, M ;

SHIMIZU, R .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (06) :L938-L940

[7] EPITAXIAL-GROWTH OF TIN FILMS ON (100) SILICON SUBSTRATES BY LASER PHYSICAL VAPOR-DEPOSITION [J].

NARAYAN, J ;

TIWARI, P ;

CHEN, X ;

SINGH, J ;

CHOWDHURY, R ;

ZHELEVA, T .

APPLIED PHYSICS LETTERS, 1992, 61 (11) :1290-1292

[8]

PAINE DC, 1990, MATER RES SOC S P, V191

[9] PROPERTIES OF SUPERCONDUCTING ZRN THIN-FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING [J].

TANABE, K ;

ASANO, H ;

KATOH, Y ;

MICHIKAMI, O .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (05) :L570-L572

[10]

Toth LE., 1971, TRANSITION METAL CAR, P279

← 1 2 →