SURFACE-EMITTING DEVICES WITH DISTRIBUTED BRAGG REFLECTORS GROWN BY HIGHLY PRECISE MOLECULAR-BEAM EPITAXY

被引:15
作者
SUGIMOTO, M
OGURA, I
SAITO, H
YASUDA, A
KURIHARA, K
KOSAKA, H
NUMAI, T
KASAHARA, K
机构
[1] Opto-Electronics Research Laboratories, NEC Corporation 34, Tsukuba, Ibaraki, 305, Miyukigaoka
关键词
D O I
10.1016/0022-0248(93)90565-E
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We realized extremely high absolute thickness controllability around +/-0.3% in molecular beam epitaxy growth of distributed Bragg reflectors, using a modified reflection high energy electron diffraction oscillation measurement technique. Very low threshold current density and high efficiency were obtained in InGaAs/AlGaAs surface emitting lasers by using this technique and a new periodically doped distributed Bragg reflectors.
引用
收藏
页码:1 / 4
页数:4
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