KINETICS AND MECHANISM OF SELECTIVE TUNGSTEN DEPOSITION BY LPCVD

被引：52

作者：

PAULEAU, Y

LAMI, P

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 11期

关键词：

D O I：

10.1149/1.2113664

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：2779 / 2784

页数：6

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