THE SPUTTERING OF COMPOUNDS

被引：15

作者：

WOLSKY, SP

ZDANUK, EJ

SHOOTER, D

机构：

来源：

SURFACE SCIENCE | 1964年 / 1卷 / 01期

关键词：

D O I：

10.1016/0039-6028(64)90021-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：110 / 118

页数：9

共 22 条

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ANDERSON, GS ;

WEHNER, GK .

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[2] ATOM EJECTION IN LOW ENERGY SPUTTERING OF SINGLE CRYSTALS OF FCC METALS AND OF GE AND SI [J].

ANDERSON, GS .

JOURNAL OF APPLIED PHYSICS, 1962, 33 (06) :2017-&

[3] CRYSTALLINE STRUCTURE AND SURFACE REACTIVITY [J].

GATOS, HC .

SCIENCE, 1962, 137 (3527) :311-&

[4] THE PENETRATION OF POSITIVE IONS OF LOW ENERGY INTO ALLOYS AND COMPOSITION CHANGES PRODUCED IN THEM BY SPUTTERING [J].

GILLAM, E .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1959, 11 (1-2) :55-&

[5] SPUTTERING OF SILVER BY LIGHT IONS WITH ENERGIES FROM 2 TO 12 KEV [J].

GRONLUND, F ;

MOORE, WJ .

JOURNAL OF CHEMICAL PHYSICS, 1960, 32 (05) :1540-1545

[6] STRUCTURE AND ADSORPTION CHARACTERISTICS OF (III) AND (III-) SURFACE OF INSB CLEANED BY ION BOMBARDMENT AND ANNEALING [J].

HANEMAN, D .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 14 :162-168

[7]

HANEMAN D, 1962, INT C SEMICONDUCTORS

[8]

HARRISON DE, 1962, 8TH T NATL VAC S, V1, P259

[9]

HONIG RE, 1962, 5TH P INT C ION PHEN, P106

[10]

KOEDAM M, 1961, THESIS UTRECHT

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