THE PRECISION-IMPLANT-9500 PLASMA FLOOD SYSTEM - THE ADVANCED SOLUTION TO WAFER CHARGING

An advanced wafer charge neutralization system based on plasma flood technique has been developed to achieve an ideal voltage control on the wafer surface during implantation. The system makes use of the ''self-regulating'' characteristics of low energy plasma electrons that clamp the surface potential within a few volts. Low energy electrons are generated in an are discharge plasma chamber combined with an accel/decel extraction mechanism and are transported to wafers through a guide tube that confines a dense plasma by using a combination of electrostatic suppression and a magnetic cusp field. The system has been equipped as standard on the Precision Implant 9500 and shown full yield on various charge sensitive devices.