SIMULATION OF DRY ETCH PROCESSES BY COMPOSITE

被引：10

作者：

PELKA, J

MULLER, KP

MADER, H

机构：

来源：

IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS | 1988年 / 7卷 / 02期

关键词：

D O I：

10.1109/43.3144

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：154 / 159

页数：6

共 13 条

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[3]

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[8] A GENERAL SIMULATOR FOR VLSI LITHOGRAPHY AND ETCHING PROCESSES .2. APPLICATION TO DEPOSITION AND ETCHING [J].

OLDHAM, WG ;

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[9]

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[10]

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