DETERMINATION OF THE FLUORINE CONCENTRATION IN SILICON FILMS GROWN FROM THE DISPROPORTIONATION OF SIF2

被引：9

作者：

MOSER, F ^{[1
]}

JANAI, M ^{[1
]}

WEIL, R ^{[1
]}

PRATT, B ^{[1
]}

KALISH, R ^{[1
]}

LEVIN, K ^{[1
]}

BRENER, R ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,INST SOLID STATE,HAIFA,ISRAEL

来源：

关键词：

D O I：

10.1016/0040-6090(82)90636-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：161 / 165

页数：5

共 10 条

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