THERMAL-STABILITY OF PURE A-SI FILMS PREPARED BY RF-BIAS SPUTTERING

被引：8

作者：

SUZUKI, M

SUZUKI, M

KANADA, M

KAKIMOTO, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 02期

关键词：

D O I：

10.1143/JJAP.21.L89

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：L89 / L91

页数：3

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