ANISOTROPIC REACTIVE ION ETCHING OF TITANIUM

被引：13

作者：

BLUMENSTOCK, K ^{[1
]}

STEPHANI, D ^{[1
]}

机构：

[1] SIEMENS AG,CORP RES & TECHNOL,D-8520 ERLANGEN,FED REP GER

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 04期

关键词：

D O I：

10.1116/1.584806

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：627 / 632

页数：6

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