QUANTITATIVE-ANALYSIS USING SPUTTERED NEUTRALS IN A SECONDARY ION MICROANALYZER

[1] SURFACE-ANALYSIS BY NONRESONANT MULTIPHOTON IONIZATION OF DESORBED OR SPUTTERED SPECIES [J]. ANALYTICAL CHEMISTRY, 1984, 56 (09) : 1671 - 1674

[2] Bernheim M., 1973, International Journal of Mass Spectrometry and Ion Physics, V10, P293, DOI 10.1016/0020-7381(73)83007-4

[3] EXPERIMENTAL AND THEORETICAL APPROACHES TO THE IONIZATION PROCESS IN SECONDARY-ION EMISSION [J]. SURFACE SCIENCE, 1979, 90 (02) : 495 - 547

[4] SECONDARY POSITIVE ION EMISSION FROM METAL SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (01) : 1 - 8

[5] NEW TECHNIQUE FOR ELEMENTAL ANALYSIS OF THIN SURFACE LAYERS OF SOLIDS [J]. APPLIED PHYSICS LETTERS, 1971, 19 (09) : 350 - &

[6] CROSET M, 1976, CORROS SCI, V16, P703, DOI 10.1016/0010-938X(76)90004-4

[7] APPLICATION OF ION MICROPROBE ANALYZER TO MEASUREMENT OF DISTRIBUTION OF BORON IONS IMPLANTED INTO SILICON CRYSTALS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (09) : 1654 - +

[8] ANALYSIS OF SOLIDS BY SECONDARY ION AND SPUTTERED NEUTRAL MASS-SPECTROMETRY [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 37 (04): : 211 - 220

[9] HENNEQUIN JF, 1969, CR ACAD SCI B PHYS, V268, P1507

[10] THE QUANTITATIVE APPLICATION OF SIMS TO CADMIUM MERCURY TELLURIDE [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1983, 46 (JAN): : 527 - 530

[1] SURFACE-ANALYSIS BY NONRESONANT MULTIPHOTON IONIZATION OF DESORBED OR SPUTTERED SPECIES [J]. ANALYTICAL CHEMISTRY, 1984, 56 (09) : 1671 - 1674

[2] Bernheim M., 1973, International Journal of Mass Spectrometry and Ion Physics, V10, P293, DOI 10.1016/0020-7381(73)83007-4

[3] EXPERIMENTAL AND THEORETICAL APPROACHES TO THE IONIZATION PROCESS IN SECONDARY-ION EMISSION [J]. SURFACE SCIENCE, 1979, 90 (02) : 495 - 547

[4] SECONDARY POSITIVE ION EMISSION FROM METAL SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (01) : 1 - 8

[5] NEW TECHNIQUE FOR ELEMENTAL ANALYSIS OF THIN SURFACE LAYERS OF SOLIDS [J]. APPLIED PHYSICS LETTERS, 1971, 19 (09) : 350 - &

[6] CROSET M, 1976, CORROS SCI, V16, P703, DOI 10.1016/0010-938X(76)90004-4

[7] APPLICATION OF ION MICROPROBE ANALYZER TO MEASUREMENT OF DISTRIBUTION OF BORON IONS IMPLANTED INTO SILICON CRYSTALS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (09) : 1654 - +

[8] ANALYSIS OF SOLIDS BY SECONDARY ION AND SPUTTERED NEUTRAL MASS-SPECTROMETRY [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 37 (04): : 211 - 220

[9] HENNEQUIN JF, 1969, CR ACAD SCI B PHYS, V268, P1507

[10] THE QUANTITATIVE APPLICATION OF SIMS TO CADMIUM MERCURY TELLURIDE [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1983, 46 (JAN): : 527 - 530